Agnieszka Zawadzka, Joanna Prazmowska, Regina Paszkiewicz
Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers
Číslo: 3/2019
Periodikum: Advances in Electrical and Electronic Engineering
DOI: 10.15598/aeee.v17i3.3357
Klíčová slova: Chromium etching; photolithography mask fabrication, sapphire substrate.
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