Neeraj Gupta, Prashant Kumar
Elicitation of Scattering Parameters of Dual-halo Dual-dielectric Triple-material Surrounding Gate (DH-DD-TM-SG) MOSFET for Microwave Frequency Applications
Číslo: 1/2021
Periodikum: Advances in Electrical and Electronic Engineering
DOI: 10.15598/aeee.v19i1.3788
Klíčová slova: Admittance parameter; cut-off frequency; halo implantation; scattering parameter; triple material.
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